Photography by Gabiele Photography
Ellipsometry
Ellipsometry is a technique used to analyze the optical properties of thin films, such as composition, dielectric permittivity, band gap, refractive index, and the thickness of the material layers. The process to obtain the optical properties is to strikes the beam polarized light on a sample and analyze the changes of the reflected light, this allows to know the structural and optical composition of the sample.
In the SAOM-Lab there are two spectro- ellipsometers with variable angle, which allow to obtain information of the optical properties in a wide spectral range. Ellipsometry technique is a fast, low cost and can be used in single and multi-layer thin film.
Ellipsometry advantages:
- Non-destructive and contactless technique
- accurate < 10 nm
- Parameters obtained by ellipsometry:
- Optical constants of a material.
- chemical composition,
- Roughness
- Thickness
- Study of dielectric materials or metals
- Optical constants of a material.
Equipment:
- Spectro- ellipsometer Woollam M-44 (282nm-763nm)
- Spectro- ellipsometer Woollam M-2000 DI (193nm-1690nm)